We present a new method for increasing the resolution of direct femtosecond laser writing by multiphoton polymerization, based on quencher diffusion. This method relies on the combination of a mobile quenching molecule with a slow laser scanning speed, allowing the diffusion of the quencher in the scanned area and the depletion of the multiphoton-generated radicals. The material we use is an organic-inorganic hybrid, while the quencher is a photopolymerizable amine-based monomer which is bound on the polymer backbone upon fabrication of the structures. We use this method to fabricate woodpile structures with a 400 nm intralayer period. This is comparable to the results produced by direct laser writing based on stimulated-emission-depletion microscopy, the method considered today as state-of-the-art in 3D structure fabrication. We optically characterize these woodpiles to show that they exhibit well-ordered diffraction patterns and stopgaps down to near-infrared wavelengths. Finally, we model the quencher diffusion, and we show that radical inhibition is responsible for the increased resolution.

Recent developments in laser nanotechnologies allow overcoming optical limitations at the 100 nm level of spatial resolution. However, at such distances spatial restrictions on nanostructuring can be imposed by nonlocal response of the media. In the present paper, we consider nanostructuring by means of locally initiated radical polymerization of multifunctional monomers. Such local initiation can be provided, for instance, by femtosecond laser techniques. We theoretically analyze the limitations imposed by diffusion on the formation of two separate nanofeatures such as voxels, rods, and plates. Owing to the percolationlike transition occurring during the polymerization process, mathematical criteria for possible separation of such features are formulated. We develop a theoretical approach by consecutively taking into account diffusion of radicals of growing length. This approach allows us to estimate a characteristic spatial scale which determines the spatial resolution for the particular polymerizing system. For several realistic polymerizable resins, this resolution limit was estimated to be on the order of 10-100 nm.

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We consider nanopatterning of dielectric substrates by harmonics of single powerful femtosecond pulses from a Ti:Sapphire laser. The nanopatterning is mediated by closely packed monolayers of polystyrene microspheres that act as microlenses at the surface. Observed modification of the material proceeds via ionization. By our theory, the second harmonic is more effective in multi-photon ionization and is better focused than the fundamental frequency which is effective in multiplying of the amount of free electrons via impact ionization. Experiments show that conversion of a part of the pulse energy into the second harmonic decreases the modification threshold and improves the localization of the structures. Optimization of the time offset between the harmonics could further improve the efficiency and quality of nanostructuring.

Colloidal particle lens array (CPLA) proved to be an efficient near-field focusing device for laser nanoprocessing of materials. Within CPLA, spherical particles do not act as independent microlenses. Due to the coupling of the spherical modes, the field near the clusters of spherical microparticles cannot be calculated by means of the superposition of Mie solutions for individual spheres. In the paper, the electromagnetic field distributions near laser-irradiated clusters of dielectric microspheres with configurations that match the fragments of the close-packed CPLA are studied. It is shown that some practically important mode coupling effects can be understood in terms of an effective immersion medium formed for the spherical particle by its surrounding.