A three-point-star DNA motif has been designed and constructed, which can self-assemble into hexagonal two-dimensional lattices. The resulting lattices are up to 1 mm.

Weakly ferromagnetic cobalt nanoparticles can assemble spontaneously into nanosized "bracelets" when dispersed in organic solvents containing resorcinarenes as surfactants. Bracelet self-assembly occurs in solution and is directed by magnetic dipolar interactions, whereas nanoparticle rings with larger diameters are produced by evaporation-driven flow on wetted surfaces.

Thin noble metal films have been prepared as a result of the immersion of germanium substrates into dilute, aqueous solutions of AuCl 4-, PdCl 4 2-, or PtCl 4 2-, respectively. Deposition proceeds via galvanic displacement in the absence of fluoride, pH adjusters, complexing agents, or external reducing agents. This manner of metal deposition serves as a cost-effective, high-throughput methodology with control over surface morphology and deposition rate by modulation of plating parameters such as concentration, temperature, and immersion time.Recent progress toward metallization on the diminishing size regimes dictated by the feverishly evolving disciplines of nanotechnology has imposed increasingly stringent demands upon thin film preparation methodologies.1 Ultra large scale integration (ULSI) device fabrication, nanoelectromechanical systems (NEMS), and arrayed nanosensors will require unparalleled control of metal film surface morphology, deposition rate, and substrate adhesion without sacrificing throughput or cost effectiveness. Furthermore, noble metal films of this type are important for fundamental investigations aimed at elucidating the intricate nature of interfacial topics ranging from self-assembled monolayers (SAMs) to sensing and heterogeneous catalysis. [2][3][4][5][6][7][8] In contrast to complex and expensive vacuum methods of metallization, research in our laboratory has focused on the preparation of noble metal thin films on semiconductor substrates via electroless deposition. Herein we describe the implementation of this facile methodology to prepare nanostructured, high surface area noble metal films with control over surface morphology and deposition rate. Moreover, metal films prepared in this manner exhibit excellent adhesion to the underlying semiconductor substrate."Electroless" plating is a term coined by Brenner and Riddell 9 to describe the spontaneous reduction of metal ions to metallic particles and films in the absence of an external source of electric current. 10 This method has attracted great interest due to simplicity of operation, cost effectiveness, high throughput, and lack of elaborate equipment. [10][11][12] Electroless deposition is applicable to a wide range of metal/ substrate combinations, including metal-on-metal, metal-onsemiconductor, and metal-on-insulator. This is particularly important with regard to metal deposition on electronically isolated substrate regions, such as those on a circuit board, for example. The literature commonly utilizes the term "electroless deposition" interchangeably to describe three fundamentally different plating mechanisms (Figure 1). 11These include autocatalytic, substrate catalyzed, and galvanic displacement (immersion) processes. Autocatalytic plating baths are commonly employed in electronics fabrication and typically contain a metal salt, pH adjuster, complexing agent, reducing agent, and other various additives.12 Once initiated, the reduced metal species serves to catalyze subsequent metal * Corresponding author. E-ma...

This paper reports a novel DNA six-point-star motif assembled from only three different DNA single-strands. This motif readily assembles into hexagonal two-dimensional arrays with high connectivity. Such a high connectivity could potentially improve the array stability.

We have developed a strategy for preparing antibody nanoarrays by DNA templating. In the resulting tetragonal antibody arrays, each spot is a similarly orientated, individual antibody molecule (IgG). The separation between two adjacent IgG molecules is only approximately 20 nm.