Chemical vapor deposition (CVD) of boron from BCl3 and H2 was investigated in a dual-impinging jet reactor which was connected to an FT-IR spectrometer for on-line chemical analysis of the reactor outlet stream. Formation of the intermediate, BHCl2, during CVD of boron on a hot tungsten substrate was experimentally verified. Boron deposition started at substrate temperatures of around 750 °C and showed a significant deposition rate increase with an increase in temperature. At a surface temperature of 1350 °C, fractional conversion of BCl3 to B and BHCl2 was found to be around 0.6 and 0.2, respectively. At temperatures less than 1100 °C, fractional conversion of BCl3 to BHCl2 was found to be higher than the fractional conversion to boron. Formation of BHCl2 occurs in the gas phase even at temperatures lower than 750 °C. Contribution of surface reactions to the formation of BHCl2 increases with an increase in temperature.

Thermal cracking of n-hexadecane was investigated in a temperature range of 450−600 °C in the presence of CO2. Effects of pressure and temperature on product distribution were experimentally determined under both subcritical and supercritical conditions. At 1.2 MPa and with a CO2 to n-C16 mole ratio of 25, C6−C14 olefins, C10−C17 paraffins, and C5−C10 fatty acids were identified in the liquid product. Experiments conducted at 4.5 MPa (supercritical) yielded higher selectivities for fatty acids and paraffins. The product distribution of fatty acids and olefins was found to be very sensitive to pressure and temperature. It was also concluded that heterogeneous carbon formation on the reactor surface was inhibited by the supercritical phase.