The interaction of vapor-deposited Al atoms with self-assembled monolayers (SAMs) of HS(CH2)15CH3 and HS(CH2)15CO2CH3 chemisorbed at Au{111} surfaces was studied using X-ray photoelectron spectroscopy, infrared spectroscopy, time-of-flight secondary ion mass spectrometry, and spectroscopic ellipsometry. For the CH3-terminated SAM, no reaction with C−H or C−C bonds was observed. For total Al doses up to ∼12 atoms/nm2, penetration to the Au−S interface occurs with no disruption of the average chain conformation and tilt, indicating formation of a highly uniform ∼1:1 Al adlayer on the Au. Subsequently, penetration ceases and a metallic overlayer begins to form at the SAM−vacuum interface. These results are explained in terms of an initial dynamic hopping of the −S headgroups on the Au lattice, which opens transient diffusion channels to the Au−S interface, and the closing of these channels upon completion of the adlayer. In contrast, Al atom interactions with the CO2CH3-terminated SAM are restricted to the vacuum interface, where in the initial stages discrete organometallic products form via reaction with the CO2CH3 group. First, a 1:1 complex forms with a reduced CO bond and an intact CH3 moiety. Further exposure leads to the additional reaction of about four Al atoms per ester, after which a metallic overlayer nucleates in the form of clusters. After the growth progresses to ∼30 Å, the clusters coalesce into a uniform metallic film. These results illustrate the extraordinary degree of control that organic substrates can exert during the course of metal film formation.

The interaction of vapor-deposited Al atoms with self-assembled monolayers (SAMs) of HS-(CH(2))(16)-X (X = -OH and -OCH(3)) chemisorbed at polycrystalline Au[111] surfaces was studied using time-of-flight secondary-ion mass spectrometry, X-ray photoelectron spectroscopy, and infrared reflectance spectroscopy. Whereas quantum chemical theory calculations show that Al insertion into the C-C, C-H, C-O, and O-H bonds is favorable energetically, it is observed that deposited Al inserts only with the OH SAM to form an -O-Al-H product. This reaction appears to cease prior to complete -OH consumption, and is followed by formation of a few overlayers of a nonmetallic type of phase and finally deposition of a metallic film. In contrast, for the OCH(3) SAM, the deposited Al atoms partition along two parallel paths: nucleation and growth of an overlayer metal film, and penetration through the OCH(3) SAM to the monolayer/Au interface region. By considering a previous observation that a CH(3) terminal group favors penetration as the dominant initial process, and using theory calculations of Al-molecule interaction energies, we suggest that the competition between the penetration and overlayer film nucleation channels is regulated by small differences in the Al-SAM terminal group interaction energies. These results demonstrate the highly subtle effects of surface structure and composition on the nucleation and growth of metal films on organic surfaces and point to a new perspective on organometallic and metal-solvent interactions.

The interaction of vapor-deposited Al atoms with self-assembled monolayers of HS(CH 2 ) 15 CO 2 H chemisorbed at polycrystalline Au(111) surfaces has been studied using time-of-flight secondary-ion mass spectrometry, X-ray photoelectron spectroscopy, and infrared spectroscopy. The Al deposition was performed incrementally at room temperature. The Al atoms do not penetrate into the organic monolayer, but rather they remain at the vacuum interface where they undergo chemical interactions solely with the CO 2 H groups. Reaction of the CO 2 H groups continues until slightly more than one atom per reacting group is deposited, on average; thereafter, no further reaction is observed. However, 20-25% of the CO 2 H groups remain unreacted, regardless of the Al coverage. These results are explained on the basis of a combination of chemical and steric effects. † Part of the special issue "Gabor Somorjai Festschrift".

A series of organic monolayers containing amine and amide functional groups on silicon and gold substrates were characterized using x-ray photoelectron and infrared spectroscopies. It was determined that the amine-terminated monolayers had 70% of the amine groups in the -NH 2 chemical state after removal from pure water. Next, Escherichia coli bacteria were exposed to the surfaces in order to evaluate the effectiveness of the monolayers as molecular adhesive agents. It was determined that the bacteria adhere readily to all of the amine monolayers but did not interact with the amide-containing monolayer.