A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algorithm is determined to be very resilient. The slit is 125 nm wide and 50 μm long and is fabricated on a 120 nm thick layer of aluminum. The size of the image field is 15 μm, and simulations indicate that 200 nm Rayleigh resolution is possible with an infinitely narrow slit.

A single scanning nano-slit is used to study aerial image characteristics. Finite-difference time-domain simulations reveal that, in the far field of such a slit, the detected image contrast is very high over a large spatial frequency range regardless of the polarization direction. In the near field, the TM polarization shows a decrease in contrast at larger spatial frequencies. Experiments verify this characteristic using a 125 nm wide slit on an aluminum mask at a wavelength of 658 nm. Unlike the light transmission characteristics of a nano-slit, which are greatly influenced by slit width and metal mask thickness, it is shown that image contrast measurement is almost insensitive to small changes in these parameters. It is found that defects on the metal mask play an important role in accurate analysis of the system.

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