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Abstract. Silicon heterojunction solar cells consist of thin amorphous silicon layers deposited on crystalline silicon wafers. This design enables energy conversion efficiencies above 20% at the industrial production level. The key feature of this technology is that the metal contacts, which are highly recombination active in traditional, diffused-junction cells, are electronically separated from the absorber by insertion of a wider bandgap layer. This enables the record open-circuit voltages typically associated with heterojunction devices without the need for expensive patterning techniques. This article reviews the salient points of this technology. First, we briefly elucidate device characteristics. This is followed by a discussion of each processing step, device operation, and device stability and industrial upscaling, including the fabrication of solar cells with energyconversion efficiencies over 21%. Finally, future trends are pointed out.

Abstract-The current losses due to parasitic absorption in the indium tin oxide (ITO) and amorphous silicon (a-Si:H) layers at the front of silicon heterojunction solar cells are isolated and quantified. Quantum efficiency spectra of cells in which select layers are omitted reveal that the collection efficiency of carriers generated in the ITO and doped a-Si:H layers is zero, and only 30% of light absorbed in the intrinsic a-Si:H layer contributes to the shortcircuit current. Using the optical constants of each layer acquired from ellipsometry as inputs in a model, the quantum efficiency and short-wavelength current loss of a heterojunction cell with arbitrary a-Si:H layer thicknesses and arbitrary ITO doping can be correctly predicted. A 4 cm 2 solar cell in which these parameters have been optimized exhibits a short-circuit current density of 38.1 mA/cm 2 and an efficiency of 20.8%.

Silicon heterojunction solar cells have record-high open-circuit voltages but suffer from reduced short-circuit currents due in large part to parasitic absorption in the amorphous silicon, transparent conductive oxide (TCO), and metal layers. We previously identified and quantified visible and ultraviolet parasitic absorption in heterojunctions; here, we extend the analysis to infrared light in heterojunction solar cells with efficiencies exceeding 20%. An extensive experimental investigation of the TCO layers indicates that the rear layer serves as a crucial electrical contact between amorphous silicon and the metal reflector. If very transparent and at least 150 nm thick, the rear TCO layer also maximizes infrared response. An optical model that combines a ray-tracing algorithm and a thin-film simulator reveals why: parallel-polarized light arriving at the rear surface at oblique incidence excites surface plasmons in the metal reflector, and this parasitic absorption in the metal can exceed the absorption in the TCO layer itself. Thick TCO layers-or dielectric layers, in rear-passivated diffused-junction silicon solar cells-reduce the penetration of the evanescent waves to the metal, thereby increasing internal reflectance at the rear surface. With an optimized rear TCO layer, the front TCO dominates the infrared losses in heterojunction solar cells. As its thickness and carrier density are constrained by anti-reflection and lateral conduction requirements, the front TCO can be improved only by increasing its electron mobility. Cell results attest to the power of TCO optimization: With a high-mobility front TCO and a 150-nm-thick, highly transparent rear ITO layer, we recently reported a 4-cm 2 silicon heterojunction solar cell with an active-area short-circuit current density of nearly 39 mA/cm 2 and a certified efficiency of over 22%. V C 2013 American Institute of Physics. [http://dx

Silicon heterojunction solar cells have high open-circuit voltages thanks to excellent passivation of the wafer surfaces by thin intrinsic amorphous silicon (a-Si:H) layers deposited by plasma-enhanced chemical vapor deposition. We show a dramatic improvement in passivation when H 2 plasma treatments are used during film deposition. Although the bulk of the a-Si:H layers is slightly more disordered after H 2 treatment, the hydrogenation of the wafer/film interface is nevertheless improved with as-deposited layers. Employing