Nanophotonic waveguides are at the core of a great variety of optical sensors. These structures confine light along defined paths on photonic chips and provide light–matter interaction via an evanescent field. However, waveguides still lag behind free-space optics for sensitivity-critical applications such as trace gas detection. Short optical pathlengths, low interaction strengths, and spurious etalon fringes in spectral transmission are among the main reasons why on-chip gas sensing is still in its infancy. In this work, we report on a mid-infrared integrated waveguide sensor that successfully addresses these drawbacks. This sensor operates with a 107% evanescent field confinement factor in air, which not only matches but also outperforms free-space beams in terms of the per-length optical interaction. Furthermore, negligible facet reflections result in a flat spectral background and record-low absorbance noise that can finally compete with free-space spectroscopy. The sensor performance was validated at 2.566 μm, which showed a 7 ppm detection limit for acetylene with only a 2 cm long waveguide.

No abstract

Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

No abstract

Controlled fabrication of single and multiple nanostructures far below the diffraction limit using a method based on laser induced periodic surface structure (LIPSS) is presented. In typical LIPSS, multiple lines with a certain spatial periodicity, but often not well-aligned, were produced. In this work, well-controlled and aligned nanowires and nanogrooves with widths as small as 40 nm and 60 nm with desired orientation and length are fabricated. Moreover, single nanowire and nanogroove were fabricated based on the same mechanism for forming multiple, periodic structures. Combining numerical modeling and AFM/SEM analyses, it was found these nanostructures were formed through the interference between the incident laser radiation and the surface plasmons, the mechanism for forming LIPSS on a dielectric surface using a high power femtosecond laser. We expect that our method, in particular, the fabrication of single nanowires and nanogrooves could be a promising alternative for fabrication of nanoscale devices due to its simplicity, flexibility, and versatility.