Multiple Fins structured FinFET (M-FinFET) is a promising semiconductor device for future improvisation of CMOS technology. In this paper, we investigate the impact of interface trap charges (positive and negative trap) at the HfO2/Si interface in M-FinFET for the first time. The various important DC attributes, RF/analog, and linearity metrics are studied in presence and absence of traps. Simultaneously, the various trap concentration effect on the characteristics of M-FinFET are also observed. The results show that the introduction of interface trap charges (ITC) has optimized the ON current, OFF current, and also improves sub-threshold swing (SS) characteristics as compared to no trap condition. It is observed that positive trap having trap concentration of 1012/cm2 enhances the ION ~5.14x, SS by 44.75%, and various important RF/analog parameter such as transconductance (Gm) improves by a factor 5, device efficiency by 7.4% and intrinsic gain (Av) 80.4%. On the other hand, linearity parameters like VIP2, VIP3 and 1 dB compression point show better performance in presence of positive and negative trap.