No abstract

We have investigated the evolution of nanometer-scale surface morphology on crystalline and amorphous substrates during off-normal, heavy and light ion sputtering. We use in-situ X-ray reflectivity to measure kinetics of surface morphology evolution and atomic force microscopy to obtain three dimensional structure of sputtered surfaces. Roughening processes associated with material removal and smoothing processes associated with ion-induced surface transport are combined into a comprehensive kinetic model of surface morphology development.