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A through-silicon via (TSV) is established as the main enabler for a three-dimensional integrated circuit (3D IC) that increases system density and compactness. The exponential increase in TSV density led to TSV-induced catastrophic and parametric faults. We propose an original architecture that detects errors caused by TSV manufacturing defects. The proposed design for testability is a built-in technique that detects errors in an early manufacturing stage and is hence very economically attractive. The proposal is capable of testing each and every TSV in the network. The technique achieves high fault coverage and high observability.

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