In this work, the effect of an excimer laser has been studied for presenting a method for SF6 decomposition and simultaneous formation of a SiF2 layer on amorphous SiO2. Though the excimer laser did not establish a gas phase photodissociation, we have shown that UV photoablation leads strongly to molecular decomposition in the SF6–SiO2 system. Moreover, the dependence of the decomposition process on the exposure parameters such as the wavelength and intensity as well as the gas pressure and the focal point distance from the gas–solid interface has been investigated.

In this work, we investigate the enhancement of Cu emission lines of a micro-plasma induced by a Nd:YAG laser due to the thermal effect of simultaneous irradiation by a continuous wave (CW) CO(2) laser. The enhancement of the emission lines was achieved at a higher temperature with minimal distortion of the target when the focal point of the Nd:YAG laser was located approximately 1 mm away from the sample surface.

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