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In this study we evaluated several precursors such as tetrakis(dimethylamino) titanium (TDMAT), tetrakis (diethylamino) titanium (TDEAT), tetrakis(ethylmethylamino) titanium (TEMAT) along with novel PrimeTiTM, StarTiTM and TyALDTM for TiO2 ALD application with both water and ozone as the oxidizer. Each precursor is evaluated with respect to some of the important characteristics like growth rate of TiO2 per ALD cycle, range and upper limit of process temperature window, volatility and stability of precursor, chemistry with desired oxidizer etc., that are critical for the selection of the precursor. All amino-compounds had a narrow process window. Precursor decomposition was observed for TDMAT, TDEAT and TEMAT at temperature higher than 225 oC limiting the deposition process at 225 {degree sign}C. On the other hand, TiO2 ALD using PrimeTiTM and StarTiTM is observed up to 325 and 400 {degree sign}C respectively. Finally, photoelectron spectroscopy analysis of some the films will be discussed.

The application of Fourier transform infrared (FTIR) spectroscopic imaging for the analysis of the reaction products from parallel reactors has been extended to the quantitative analysis of complex infrared (IR) spectra. Multivariate factor-based and univariate calibration models were developed to extract quantitative concentration information from highly overlapped IR spectra. The three multivariate factor-based models of principal component regression (PCR) and partial least squares 1 and 2 (PLS-1 and PLS-2) were employed. The effects of the number of coadded mirror scans used in the data collection and the number of factors used in the data analysis on the predictive ability of this multivariate approach were characterized. The effectiveness of these approaches is demonstrated through application to the high-throughput study of ammonia decomposition and NOx storage and reduction catalysts.

In this work, we study the compatibility of a highly volatile strontium precursor, HyperSr, which has a low melting point, good thermal stability and good reactivity, with various Ti precursors for atomic layer deposition (ALD) of strontium titanates (STO). Novel Ti precursors studied for STO deposition include PrimeTi & StarTi. We will then discuss the interesting trends in material properties observed in STO films deposited with various compositions. X-ray photoelectron spectroscopic analysis of ALD SrO films showed the presence of carbonate groups in the film. There is the potential that this carbonate species is inherent to the ALD process; however, it has been reported that SrCO 3 forms when SrO films are exposed to atmospheric CO 2 . To isolate the effects of atmospheric exposure on the carbonate formation in the film, a TiO 2 capping layer is used on the surface of ALD SrO films and the resulting film structures are analyzed.