The fabrication of optical waveguide couplers involving tapered layers of SiO(2) is discussed. Details of the photolithographic fabrication processing sequence are presented. This process utilizes carefully controlled etchant undercutting and has been found to be quite reproducible. It has allowed fabrication of tapers having changes in Sio(2) thickness of 1.0,microm over lengths of 55-75 microm. Results are presented which demonstrate taper transverse uniformity for distances of over 600,microm. The smoothness and gradual nature of the tapers are apparent in scanning electron microscope pictures of a taper cross section.