The structural and optical properties of GaAs-based 1.3 μm InAs/InGaAs dots-in-a-well (DWELL) structures have been optimized in terms of different InGaAs and GaAs growth rates, the amount of InAs deposited, and In composition of the InGaAs quantum well (QW). An improvement in the optical efficiency is obtained by increasing the growth rate of the InGaAs and GaAs layers. A transition from small quantum dots (QDs), with a high density (∼5.3×1010 cm−2) and broad size distribution, to larger quantum dots with a low dot density (∼3.6×1010 cm−2) and narrow size distribution, occurs as the InAs coverage is increased from 2.6 to 2.9 monolayers. The room-temperature optical properties also improve with increased InAs coverage. A strong dependence of the QD density and the QD emission wavelength on the In composition of InGaAs well has been observed. By investigating the dependence of the dot density and the high-to-width ratio of InAs islands on the matrix of InGaAs strained buffer layer (SBL), we show that the increasing additional material from wetting layer and InGaAs layer into dots and the decreasing repulsive strain field between neighboring islands within substrate are responsible for improving QD density with increasing In composition in InGaAs SBL. The optical efficiency is sharply degraded when the InGaAs QW In composition is increased from 0.15 to 0.2. These results suggest that the optimum QW composition for 1.3 μm applications is ∼15%. Our optimum structure exhibits a room temperature emission of 1.32 μm with a linewidth of 27 meV.

We describe an optical study of structures consisting of an InAlAs-GaAs strained buffer layer and an InAlAs-InGaAs composite strain-reducing layer designed to modify the confining potential of 1.3-μm InAs/GaAs quantum dots (QDs). With increasing (decreasing) InAlAs (InGaAs) thickness in the strain-reducing layer grown above the QDs, the integrated photoluminescence (PL) intensity of the QD ground-state transition increases dramatically and the emission wavelength decreases slightly from 1.36 to 1.31 μm. The enhancement of PL efficiency is temperature dependent, being much greater above 200 K. A maximum enhancement of 450 is achieved at room temperature. This improvement of the high-temperature PL efficiency should lead to a significant improvement in the characteristics of 1.3-μm InAs/GaAs QD lasers.

Photomultiplication measured in Al0.6Ga0.4As p+–i–n+ diodes falls with temperature in a manner that becomes less marked with decreasing i-region width and increasing electric field. Simple arguments relate this result to the effects of the ionization dead space, which is expected to depend weakly on temperature, and to the reduced scattering in the high electric fields present in thin avalanching structures. The temperature dependence of the “enabled” ionization coefficient can be approximately accounted for by simply subtracting the ballistic dead space from the width of the avalanche region. The simple arguments suggest the effect is independent of materials system.