In this paper, we study the feasibility of using a new system to set up offline critical dimension scanning electron microscope (CDSEM) recipes for both litho and etch processes monitoring in a foundry environment before first silicon. We will automatically create CDSEM measurement recipes based on CAD design data (2) and litho illumination information. The main advantages of having recipes setup done through this method as compared to performing recipe creation on the CDSEM tool itself are the reduction in CD-SEM tool usage and more importantly, the availability of the recipes before the first wafer is being processed in lithography resulting in a faster of cycle time for new devices.To facilitate our objective, a new feature was implemented in the design to provide a universal global alignment (GA) feature under both optical and SEM view. The global alignment serves two functions: to minimize device-to-device and layer-to-layer optical variation. It synchronizes design (CAD) and wafer coordinate systems. With this universal alignment feature available across all production layers of interest, we can fully automate recipe creation process from design to production.