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We demonstrate a novel method for fabricating a well-defined and large-area microlens array combining digital micro-mirror device (DMD)-based lithography and spatially constrained thermal reflow. Using the flexible processing ability of DMD-based lithography, a micro pillar array is easily prepared on a glass substrate and then the microlens array is formed after a thermal reflow process. Differing from conventional approaches, the proposed thermal reflow process is conducted in polydimethylsiloxane (PDMS) solution instead of in the air. During the process, the partly cured PDMS can effectively prevent the photoresist crawling in the diameter direction, which is very convenient for controlling the precise shape of the microlens. In addition, the photoresist microlens array and PDMS soft mold with a concave cavity array can be achieved in one step. The experimental results showed that the photoresist microlens was good in both shape and surface quality. The presented method may offer great promise for fabricating a high-quality microlens array with different requirements in optical applications.

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