A pulsed TEA-CO 2 laser in combination with the dynamic fluidized bed powder feeder was employed to deposit a thin CeO 2 buffer layer on the polycrystalline Ni-substrate in nonvacuum environment. Use of the 30° powder jet inclination with respect to the laser beam axis along with the nano size precursor powder deposited a smooth layer on the entire surface of the substrate. Both EDS and X-ray diffractometry analyses was employed to confirm the stoichiometric nature of the deposited CeO 2 buffer layer.