We investigated the internal bias field and coercive field in a typical ferroelectric thin-film capacitor and simulated polarization switching dynamics using Euler's method. The simulation results agreed well with the experimental results and reflected the well-known polarization domain switching model in which the polarization switching occurs on the order of nucleation, growth, and coalescence. The fit parameters (damping parameters affecting the polarization change rate) also followed a certain distribution. When the expected value was used instead of full distribution, the simulation results did not agree well with corresponding experimental results. The simulation results suggested no domain structure in the polarization switching dynamics, indicating that the polarization domain structure was affected by the distribution of the fit parameters. Our results demonstrate the possibility of simulation using realistic distribution of ferroelectric properties.

We demonstrate a programmable light intensity of a micro-LED by compensating threshold voltage variability of thin-film transistors (TFTs) by introducing a non-volatile programmable ferroelectric material, HfZrO2 (HZO) into the gate...

Dielectric layers are widely used in ferroelectric applications such as memory and negative capacitance devices. The wake-up and the split-up phenomena in the ferroelectric hafnia are well-known challenges in early-stage device reliability. We found that the phenomena even occur in the bilayer, which is composed of the hafnia and the dielectrics. The phenomena are known to be affected mainly by oxygen vacancies of hafnia. Dielectric layers, which are often metal oxides, are also prone to be affected by oxygen vacancies. To study the effect of the dielectric layer on the wake-up and the split-up phenomena, we fabricated ferroelectric thin-film capacitors with dielectric layers of various thicknesses and measured their field-cycling behaviors. We found that the movement of oxygen vacancies in the dielectric layer was predominantly affected by the polarization state of the ferroelectric layer. In addition, the mechanism of the field-cycling behavior in the bilayer is similar to that in ferroelectric thin films. Our results can be applied in ferroelectric applications that use dielectric layers.