Reported here are in situ scanning tunneling microscopy (STM) results of underpotential deposition (UPD) of copper at an iodine-modified Pt(100) electrode. The cyclic voltammograms reveal that an iodine adlayer strongly adsorbed on Pt(100) resulted in a 350 mV delay of Cu deposition with respect to that of a bare Pt(100) electrode. High-quality in situ STM imaging reveals the atomic structures of the iodine adlayers before and after the deposition of Cu adatoms. Depending on the dosage of iodine vapor to an annealed Pt(100) electrode, two ordered structures of the iodine adatoms are formed and are characterized as ( 2 × 5 2)R45°and ( 2 × 9 2)R45°with coverage of 0.6 and 0.55, respectively. The predominant interadsorbate interaction results in adsorption of iodine at either symmetric 4-fold or asymmetric sites. Since the Cu deposit displaces the iodine adatoms on Pt(100), the iodine adatoms with weaker surface bonding are replaced first, leading to anisotropic deposition. Regardless of the initial iodine structures on Pt(100), deposition of Cu results in a c(2 × 2) structure. The deposition and dissolution processes are reversible with respect to the Cu adatoms but the iodine overlayer undergoes irreversible reconstruction from ( 2 × 5 2)R45°to c(2 × 2). In situ STM atomic imaging at the onset of bulk Cu deposition also reveals protruding islands with ordered c(2 × 2) structure of iodine adatoms, suggesting a pseudomorphic structure of the 2nd Cu adlayer.

In-situ scanning tunneling microscopy (STM) coupled with cyclic voltammetry was used to examine the adsorption of carbon monoxide (CO) molecules on an ordered Au(111) electrode in 0.1 M HClO4. Molecular resolution STM revealed the formation of several commensurate CO adlattices, but the (9 x radical 3) structure eventually prevailed with time. The CO adlayer was completely electrooxidized to CO2 at 0.9 V versus RHE in CO-free 0.1 M HClO(4), as indicated by a broad and irreversible anodic peak which appeared at this potential in a positive potential sweep from 0.05 to 1.6 V. A maximal coverage of 0.3 was estimated for CO admolecules from the amount of charge involved in this feature. Real-time in-situ STM imaging allowed direct visualization of the adsorption process of CO on Au(111) at 0.1 V, showing the lifting of (radical 3 x 22) reconstruction of Au(111) and the formation of ordered CO adlattices. The (9 x radical 3) structure observed in CO-saturated perchloric acid has a coverage of 0.28, which is approximately equal to that determined from coulometry. Switching the potential from 0.1 to -0.1 V restored the reconstructed Au(111) with no change in the (9 x radical 3)-CO adlattice. However, the reconstructed Au(111) featured a pairwise corrugation pattern with two nearest pairs separated by 74 +/- 1 A, corresponding to a 14% increase from the ideal value of 65.6 A known for the ( radical 3 x 22) reconstruction. Molecular resolution STM further revealed that protrusions resulting from CO admolecules in the (9 x radical 3) structure exhibited distinctly different corrugation heights, suggesting that the CO molecules resided at different sites on Au(111). This ordered structure predominated in the potential range between 0.1 and 0.7 V; however, it was converted into new structures of (7 x radical 7) and ( radical 43 x 2 radical 13) on the unreconstructed Au(111) when the potential was held at 0.8 V for ca. 60 min. The coverage of CO adlayer decreased accordingly from 0.28 to 0.13 before it was completely removed from the Au(111) surface at more positive potentials.

In situ scanning tunneling microscopy (STM) and cyclic voltammetry (CV) were employed to examine the underpotential deposition (UPD) of cadmium on a rhodium(111) electrode in sulfuric and hydrochloric acids. The (bi)sulfate and chloride anions in the electrolytes played a main role in controlling the number and arrangement of Cd adatoms. Deposition of Cd along with hydrogen adsorption occurred near 0.1 V (vs reversible hydrogen electrode) in either 0.05 M H2SO4 or 0.1 M HCl containing 1 mM Cd(ClO4)2. These coupled processes resulted in an erroneous coverage of Cd adatoms. The process of Cd deposition shifted positively to 0.3 V and thus separated from that of hydrogen in 0.05 M H2SO4 containing 0.5 M Cd2+. The amount of charge (80 microC/cm2) for Cd deposition in 0.5 M Cd2+ implied a coverage of 0.17 for the Cd adatoms, which agreed with in situ STM results. Regardless of [Cd2+], in situ STM imaging revealed a highly ordered Rh(111)-(6 x 6)-6Cd + HSO4- or SO42- structure in sulfuric acid,. In hydrochloric acid, in situ STM discerned a (2 x 2)-Cd + Cl structure at potentials where Cd deposition commenced. STM atomic resolution showed roughly one-quarter of a monolayer of Cd adatoms were deposited, ca. 50% more than in sulfuric acid. Dynamic in situ STM imaging showed potential dependent, reversible transformations between the (6 x 6) Cd adlattices and (square root 3 x square root 7)-(bi)sulfate structure, and between (2 x 2) and (square root 7 x square root 7)R19.1 degrees -Cl structures. The fact that different Cd structures observed in H2SO4 and HCl entailed the involvement of anions in Cd deposition, i.e. (bi)sulfate and chloride anions were codeposited with Cd adatoms on Rh(111).