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We present a study of the nanotribological behavior of ZnTiO 3 films; the surface morphology, stoichiometry, and friction (m) were analyzed using atomic force microscopy, X-ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and m of the ZnTiO 3 films were in the range from 8.5 AE 0.4 to 5.6 AE 0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO 3 decomposes into cubic Zn 2 TiO 4 and rutile TiO 2 based on the thermal treatment; the H, m, and R MS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO 3 films. From X-ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as-deposited films are mainly amorphous; however, the hexagonal ZnTiO 3 phase was observed with the ZnTiO 3 (104), (110), (116), and (214) peaks from 620 to 820 C, indicating that there is highly (104)-oriented ZnTiO 3 on the silicon substrate.

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