Critical issues that occur during the fabrication of high‐density nanostructures by e‐beam lithography are considered. A 25‐nm‐pitch Si nanopillar array and a 15‐nm‐pitch resist nanodot array are fabricated. Transfer of 1 teradot inch−2 patterns from the nanopillar array to a polymer surface is carried out by nanoimprint lithography (see picture).
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