Heteroepitaxy of high-quality GaN-based heterostructures with tunable band alignment and optical properties is of central importance for their applications in electronics and optoelectronics. Incommensurate material growth on GaN substrate with...

Monolayer transition metal dichalcogenide (TMD) alloys with tunable band gaps exhibit huge potential in nanoelectronics, optoelectronics, and photonics. The scalable production of uniform atomically thin TMD alloys is a key step for the realization of their device applications but remains a large challenge so far. Here, we report oxygen-assisted chemical vapor deposition (CVD) of uniform atomically thin MoS 2(1−x) Se 2x semiconductor alloys via a vertical Mo-precursor supply strategy. The growth scheme leads to the formation of highly crystalline MoS 2(1−x) Se 2x monolayer films within a short growth time of 8 min, which benefits from a stable and homogeneous Mo-precursor feeding environment and the synergic effect of NaBr and oxygen carrier on the growth. The high-resolution spectral characterizations and density functional theory calculations demonstrate that the chemical composition of the as-grown MoS 2(1−x) Se 2x monolayers can be continuously tuned from x = 0 to 1, leading to the corresponding band gap being gradually changed from 1.81 to 1.55 eV. This work provides an efficient strategy to obtain large-area uniform MoS 2(1−x) Se 2x monolayer alloys with tunable compositions and optical properties, which is essential for driving their applications in various functional optoelectronic devices, especially for high-performance flexible photodetectors.

The epitaxial growth of low-dimensional tin chalcogenides SnX (X = S, Se) with a controlled crystal phase is of particular interest since it can be utilized to tune optoelectronic properties and exploit potential applications. However, it still remains a great challenge to synthesize SnX nanostructures with the same composition but different crystal phases and morphologies. Herein, we report a phase-controlled growth of SnS nanostructures via physical vapor deposition on mica substrates. The phase transition from α-SnS (Pbnm) nanosheets to β-SnS (Cmcm) nanowires can be tailored by the reduction of growth temperature and precursor concentration, which originates from a delicate competition between SnS-mica interfacial coupling and phase cohesive energy. The phase transition from the α to β phase not only greatly improves the ambient stability of SnS nanostructures but also leads to the band gap reduction from 1.03 to 0.93 eV, which is responsible for fabricated β-SnS devices with an ultralow dark current of 21 pA at 1 V, an ultrafast response speed of ≤14 μs, and broadband spectra response from the visible to near-infrared range under ambient condition. A maximum detectivity of the β-SnS photodetector arrives at 2.01 × 10 8 Jones, which is about 1 or 2 orders of magnitude larger than that of α-SnS devices. This work provides a new strategy for the phase-controlled growth of SnX nanomaterials for the development of highly stable and high-performance optoelectronic devices.