No abstract

An optical waveguide and a grating coupler based on silicon photonics are designed and fabricated. The device is intended for monitoring the spectral line 777 nm of oxygen plasma, which corresponds to electron relaxation of oxygen atoms in the plasma. To provide a maximum surface-coupling efficiency, we optimize the thickness of silicon-oxide cladding and the geometry of the grating coupler, using finite differential time-domain simulations. Two methods are used when fabricating a silicon photonic chip, a micro-fabrication with electron-beam lithography and a semiconductor-based process that employs a 248 nm optical lithography technology. We suggest our coupler as a conceptual approach to onwafer photon-collecting devices designed for studying glow-discharge plasmas.

No abstract