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This paper describes a modified Sagnac interferometer with a self-referenced polarization and phase-shifting technique for real-time thickness measurement of single- and double-layer transparent thin films. The proposed interferometric setup generated outstanding rotating linearly polarized light with a degree of polarization (DOP) of 99.40%. A beam splitter placed at the interferometer output separated the beam into two identical linearly polarized beams. One of the beams served as a reference, while the other served as a sensing arm. The output linear polarizer set at 45° relative to a reference plane was positioned anterior to the photodetectors to get rotating light intensities for phase shift measurement; hence, the intensities at various polarizations of 0°, 45°, and 90° were automatically acquired without any polarizing device adjustments. These intensities were then transformed into a phase retardation introduced by a sample, and the resulting phase shift was eventually converted into film thickness. The samples were properly prepared, with pure BK7 substrate being deposited by WO3-, Ta2O5-, and WO3/Ta2O5 films of known thicknesses. The thickness measurement obtained from the proposed system yielded reading errors of 1.3%, 0.2%, and 1.3/2.5% for WO3-, Ta2O5-, and WO3/Ta2O5 films, respectively. The mathematical theory was effectively demonstrated and empirically confirmed. The experimental results show that the proposed setup has a lot of potential for real-time, non-destructive thickness assessment of transparent thin films without the need to modify polarizing device orientations.

An alternative polarization phase-shifting technique is proposed to determine the thickness of transparent thin-films. In this study, the cyclic interferometric configuration is chosen to maintain the stability of the operation against external vibrations. The incident light is simply split by a non-polarizing beam splitter cube to generate test and reference beams, which are subsequently polarized by a polarizing beam splitter. Both linearly polarized beams are orthogonal and counter-propagating within the interferometer. A wave plate is inserted into the common paths to introduce an intrinsic phase difference between the orthogonal polarized beams. A transparent thin-film sample, placed in one of the beam tracks, modifies the output signal in terms of the phase retardation in comparison with the reference beam. The proposed phase-shifting technique uses a moving mirror with a set of “fixed” polarizing elements, namely, a quarter-wave retarder and a polarizer, to facilitate phase extraction without rotating any polarizing devices. The measured thicknesses are compared with the measurements of the same films acquired using standard equipment such as the field-emission scanning electron microscope and spectroscopic ellipsometer. Experimental results with the corresponding measured values are in good agreement with commercial measurements. The system can be reliably utilized for non-destructive thickness measurements of transparent thin-films.

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This paper presents the comparison of three-, four- and five-step techniques for measuring transparent thin-film thickness of T a 2 O 5 and W O 3 deposited on BK-7 substrates. The Sagnac interferometer was modified with phase shifting approach for the determination of thin-film thickness. The input light beam was split into reference and testing beams. Before the output light reaching the balanced photodetectors, the real-time signal detection was performed to obtain the output intensities of both beams using three-, four-, and five-polarization settings of an analyzer. The thicknesses could then be efficiently translated from the measured intensities. Thicknesses from three-, four- and five-stepping algorithms were compared with ones from the conventional FE-SEM measurement, and it was discovered that the former performed better with less errors. The findings show that the phase-shifting technique using three-polarization settings is more suitable for the thickness measurement of the transparent thin film.