Abstract-Laser fault injection into SRAM cells is a widely used technique to perform fault attacks. In previous works, Roscian and Sarafianos studied the relations between the layout of the cell, its different laser-sensitive areas and their associated fault model using 50 ns duration laser pulses. In this paper, we report similar experiments carried out using shorter laser pulses (30 ps duration instead of 50 ns). Laser-sensitive areas that did not appear at 50 ns were observed. Additionally, these experiments confirmed the validity of the bit-set/bit-reset fault model over the bit-flip one. We also propose an upgrade of the simulation model they used to take into account laser pulses in the picosecond range. Finally, we performed additional laser fault injection experiments on the RAM memory of a microcontroller to validate the previous results.

Experimental validation of a BBICS for detecting laser-induced currents Clément Champeix

This paper presents the design of a CMOS 40 nm D Flip-Flop cell and reports the laser fault sensitivity mapping both with experiments and simulation results. Theses studies are driven by the need to propose a simulation methodology based on laser/silicon interactions with a complex integrated circuit. In the security field, it is therefore mandatory to understand the behavior of sensitive devices like D Flip-Flops to laser stimulation. In previous works, Roscian et al., Sarafianos et al., Lacruche et al. or Courbon et al. studied the relations between the layout of cells, its different laser-sensitive areas and their associated fault model using laser pulse duration in the nanosecond range. In this paper, we report similar experiments carried out using a shorter laser pulse duration (30 ps instead of 50 ns). We also propose an upgrade of the simulation model they used to take into account laser pulse durations in the picosecond range on a logic gate composed of a large number of transistors for a recent CMOS technology (40 nm).

International audience— This study is driven by the need to optimize failure analysis methodologies based on laser/silicon interactions with an integrated circuit using a triple-well process. It is therefore mandatory to understand the behavior of elementary devices to laser illumination, in order to model and predict the behavior of more complex circuits. This paper presents measurements of the photoelectric currents induced by a pulsed-laser on an NMOS transistor in triple-well Psubstrate/DeepNwell/Pwell structure dedicated to low power body biasing techniques. This evaluation compares the triple-well structure to a classical Psubstrate-only structure of an NMOS transistor. It reveals the possible activation change of the bipolar transistors. Based on these experimental measurements, an electrical model is proposed that makes it possible to simulate the effects induced by photoelectric laser stimulation

No abstract