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Microwave performance of a self-aligned GaInP/ GaAs heterojunction bipolar transistor (HBT) is presented. At an operating current density of 2.08 X lo4 A/cmZ, the measured cutoff frequency is 50 GHz, and the maximum oscillation frequency extrapolated from measured unilateral gain and the maximum available gain are 116 and 81 GHz, respectively, all using 20-dB/decade slopes. To the author's knowledge, these represent the highest reported values of HBT's based on the GaInP/GaAs material system. These results are compared with other reported high-frequency performance of GaInP HBT's. In addition, these results are compared with AIGaAs/GaAs HBTs having a similar device structure.

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Minority-carrier electron-diffusion coefficients and lifetimes have been measured in heavily doped p-type GaAs using the zero-field time-of-flight (ZFTOF) technique. The materials studied included C-doped GaAs grown by molecular-beam epitaxy (MBE) using graphite as the dopant source, C-doped GaAs grown by metalorganic chemical-vapor deposition (MOCVD) using CCl4 as the dopant source, and Be-doped GaAs grown by MBE. Room-temperature photoluminescence intensity measurements were made on the structures and the results are compared with ZFTOF measurements of lifetime. The graphite-doped material (p∼1019 cm−3) exhibited diffusion lengths of less than 1000 Å. MOCVD-grown C-doped GaAs, which was optimized by adjusting the growth conditions to maximize the room-temperature photoluminescence intensity, had diffusion lengths comparable to those measured in Be-doped GaAs for hole concentrations of 1×1019 and 5×1019 cm−3. Comparison of photoluminescence intensities also suggests that addition of In to very heavily doped MOCVD-grown GaAs (p≳1020 cm−3) to eliminate the lattice mismatch with respect to the substrate does not result in an improvement in lifetime.