We report on integrated, silicon single-nanowire diodes. Gold catalyst templates, defined by lithography, controlled the location of nanowires grown with a vapor-liquid-solid mechanism. The nanowire growth, by atmospheric-pressure chemical vapor deposition, used SiCl4 diluted in H2 on (100) n-type silicon substrates. Postgrowth oxidation and wet etching reduced the nanowire diameters and removed unintentional small diameter nanowires. Spin-on glass isolated the nanowire tips from the substrate, which were then contacted with aluminum. Current-voltage measurements show rectification and ideality factors consistent with pn junction diodes. However, the gold catalyzed nanowires have much higher than expected hole concentrations that cannot be explained by behaviors reported for gold diffused into silicon.
The major purpose of this paper is to find an alternative configuration that not only minimizes the limitations of single-gate (SG) MOSFETs but also provides the better replacement for future technology. In this paper, the electrical characteristics of SiGe double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si double-gate N-MOSFET. Furthermore, in this paper the electrical characteristics of Si double-gate N-MOSFET are demonstrated and compared with electrical characteristics of Si single-gate N-MOSFET. The simulations are carried out for the device at different operational voltages using Cogenda Visual TCAD tool. Moreover, we have designed its structure and studied both
characteristics for different voltages namely 0.05, 0.1, 0.5, 0.8, 1 and 1.5 V and
characteristics for different voltages namely 0.1, 0.5, 1 and 1.5 V at work functions 4.5, 4.6 and 4.8 eV for this structure. The performance parameters investigated in this paper are threshold voltage, DIBL, subthreshold slope, GIDL, volume inversion and MMCR.
IV-measurements were performed on integrated silicon nanowires grown via atmospheric vapor phase epitaxy. The silicon nanowires were grown on a n-type substrate using gold catalysts, insulated using a spin-on glass, and contacted using aluminum. Rectifying behavior and low recombination is observed in the nanowire with a forward bias.
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