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Unusual bleaching behaviour in positive 5-sulfonate based resists doped with imidazole derivatives was investigated. The reported effect observed during assessment of microlithographic characteristics of basic induced Image Reversal technique in the positive mode is explained through the formation of an exposure induced built-in bleachable dye (BICEL) formed during exposure as photoproduct of ketene and imidazole derivative. The alternative chemical pathways and microlithographic consequences are analysed in the light of in-situ CEL-like behaviour.

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