A controllable one‐pot method to synthesize N‐doped ordered mesoporous carbons (NMC) with a high N content by using dicyandiamide as a nitrogen source via an evaporation‐induced self‐assembly process is reported. In this synthesis, resol molecules can bridge the Pluronic F127 template and dicyandiamide via hydrogen bonding and electrostatic interactions. During thermosetting at 100 °C for formation of rigid phenolic resin and subsequent pyrolysis at 600 °C for carbonization, dicyandiamide provides closed N species while resol can form a stable framework, thus ensuring the successful synthesis of ordered N‐doped mesoporous carbon. The obtained N‐doped ordered mesoporous carbons possess tunable mesostructures (p6m and Im$ \bar 3 $m symmetry) and pore size (3.1–17.6 nm), high surface area (494–586 m2 g−1), and high N content (up to 13.1 wt%). Ascribed to the unique feature of large surface area and high N contents, NMC materials show high CO2 capture of 2.8–3.2 mmol g−1 at 298 K and 1.0 bar, and exhibit good performance as the supercapacitor electrode with specific capacitances of 262 F g−1 (in 1 M H2SO4) and 227 F g−1 (in 6 M KOH) at a current density of 0.2 A g−1.

Three-dimensional ordered mesoporous/macroporous carbon sphere arrays (MMCSAs) are synthesized and then used as a catalyst for Li-O2 batteries. The hierarchical porous structure of the MMCSAs not only facilitates electrolyte immersion and Li(+) diffusion but also provides an effective space for O2 diffusion and O2 /Li2 O2 conversion, and thus efficiently improves the performance of Li-O2 batteries.

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Chloride ion (Cl) is one of the most common anions in the aqueous environment. A mathematical model was developed to determine and quantify the impact of Cl on the oxidization rate of organic compounds at the beginning stage of the UV/persulfate (PS) and UV/HO processes. We examined two cases for the UV/PS process: (1) when the target organic compounds react only with sulfate radicals, the ratio of the destruction rate of the target organic compound when Cl is present to the rate when Cl is not present (designated as r/ r) is no larger than 1.942%; and (2) when the target organic compounds can react with sulfate radicals, hydroxyl radicals and chlorine radicals, r/ r, can be no larger than 60%. Hence, Cl significantly reduces the organic destruction rate in the UV/PS process. In the UV/HO process, we found that Cl has a negligible effect on the organic-contaminant oxidation rate. Our simulation results agree with the experimental results very well. Accordingly, our mathematical model is a reliable method for determining whether Cl will adversely impact organic compounds destruction by the UV/PS and UV/HO processes.

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