Metal nanostructures that support surface plasmons are compelling as plasmonic circuit elements and as the building blocks for metamaterials. We demonstrate here the spontaneous self-assembly of shaped silver nanoparticles into three-dimensional plasmonic crystals that display a frequency-selective response in the visible wavelengths. Extensive long-range order mediated by exceptional colloid monodispersity gives rise to optical passbands that can be tuned by particle volume fraction. These metallic supercrystals present a new paradigm for the fabrication of plasmonic materials, delivering a functional, tunable, completely bottom-up optical element that can be constructed on a massively parallel scale without lithography.

An experimental technique for quantitatively characterizing edge effect contributions in transmission through thick photomasks is described and evaluated through electromagnetic simulation. The technique consists of comparing the 0 th order transmission for various duty cycles to the expected experimental behavior from a thin mask model. The real electric field component from the edges is proportional to the shift in the position of the minimum energy in the 0 th order field away from the expected thin mask location. The square root of the minimum 0 th order diffraction energy normalized to a clear mask gives the imaginary edge contribution. The results indicate that Alternating Phase Shifting Masks (ALT-PSM) and Attenuating Phase Shifting Masks (ATT-PSM) technologies have significant edge effects on the order of 0.1λ to 0.2λ per edge respectively, as well as polarization dependence. For periods of 2 wavelengths and larger these edge contribution values are nearly independent of pitch. The existence of an imaginary (or quadrature) phase component is shown to result in an additive linear variation of line edge shortening through focus. This tilt can be interpreted as a focus shift of the normal parabolic behavior and is about 0.5 Rayleigh units (RU). This focus shift depends to some extent on the surrounding layout as well as the feature itself.

Direct imaging and characterization of exo-solar terrestrial planets require coronagraphic instruments capable of suppressing star light to 10 -10 . Pupil shaping masks have been proposed and designed 1 at Princeton University to accomplish such a goal. Based on Princeton designs, free standing (without a substrate) silicon masks have been fabricated with lithographic and deep etching techniques. In this paper, we discuss the fabrication of such masks and present their physical and optical characteristics in relevance to their performance over the visible to near IR bandwidth.

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