A simple and high yield method is presented for the bulk generation of atomic force microscopy (AFM) probes with self‐sharpened silicon tips. The experimental setup includes a controlled chemical etching environment at a constant temperature with continuous recirculation and filtration. A KOH solution is considered cost‐effective as the etchant and stabilized to the required concentration (55%, v/v) and temperature (40 °C), so as to provide an etch rate of 40 nm min−1 and yield a smooth etch profile. A high density of silicon tips is fabricated, with yield up to 90%, and a consistent tip radius of ≈12.73 ± 1.51 nm. These tips can be successfully integrated with AFM cantilevers, resulting in AFM probes. Further, such AFM‐probes are well characterized using laser Doppler vibrometry and scanning electron microscopy. The result shows a resonance frequency of 1.2–1.4 MHz and a high‐quality factor of ≈708.8. In addition, the AFM probes produced images are comparable in quality to those obtained from commercially available probes.