We describe design guidelines for soft x-ray wavefront sensors and experimentally demonstrate their performance, comparing grating-based lateral shearing interferometry and Hartmann wavefront sensing. We created a compact shearing interferometer concept with a dense array of binary amplitude gratings in a single membrane to support one-dimensional wavefront measurements across a wide wavelength range without the need for longitudinal position adjustment. We find that a common scaling parameter based on wavelength and the distance to the measurement plane guides the design of both systems toward optimal sensitivity. We show preliminary results from recent experiments demonstrating one and two-dimensional wavefront sensing below the Maréchal criterion.

New, high-coherent-flux X-ray beamlines at synchrotron and free-electron laser light sources rely on wavefront sensors to achieve and maintain optimal alignment under dynamic operating conditions. This includes feedback to adaptive X-ray optics. We describe the design and modeling of a new class of binary-amplitude reflective gratings for shearing interferometry and Hartmann wavefront sensing. Compact arrays of deeply etched gratings illuminated at glancing incidence can withstand higher power densities than transmission membranes and can be designed to operate across a broad range of photon energies with a fixed grating-to-detector distance. Coherent wave-propagation is used to study the energy bandwidth of individual elements in an array and to set the design parameters. We observe that shearing operates well over a ±10% bandwidth, while Hartmann can be extended to ±30% or more, in our configuration. We apply this methodology to the design of a wavefront sensor for a soft X-ray beamline operating from 230 eV to 1400 eV and model shearing and Hartmann tests in the presence of varying wavefront aberration types and magnitudes.

We demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.

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