We perform wavefront measurements of high-order harmonics using an extremeultraviolet (XUV) Hartmann sensor and study how their spatial properties vary with different generation parameters, such as pressure in the nonlinear medium, fundamental pulse energy and duration as well as beam size. In some conditions, excellent wavefront quality (up to λ/11) was obtained. The high throughput of the intense XUV beamline at the Lund Laser Centre allows us to perform single-shot measurements of both the full harmonic beam generated in argon and individual harmonics selected by multilayer mirrors. We theoretically analyze the relationship between the spatial properties of the fundamental and those of the generated high-order harmonics, thus gaining insight into the fundamental mechanisms involved in high-order harmonic generation (HHG).

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.

We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyond λ / 39 root mean square (rms) at λ = 32 n m . The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics.