The highest quality hexagonal boron nitride (hBN) crystals are grown from molten solutions. For hBN crystal growth at atmospheric pressure, typically the solvent is a combination of two metals, one with a high boron solubility and the other to promote nitrogen solubility. In this study, we demonstrate that high-quality hBN crystals can be grown at atmospheric pressure using pure iron as a flux. The ability to produce excellent-quality hBN crystals using pure iron as a solvent is unexpected, given its low solubility for nitrogen. The properties of crystals produced with this flux matched the best values ever reported for hBN: a narrow Raman E2g vibration peak (7.6 cm–1) and strong phonon-assisted peaks in the photoluminescence spectra. To further test their quality, the hBN crytals were used as a substrate for WSe2 epitaxy. WSe2 was deposited with a low nucleation density, indicating the low defect density of the hBN. Lastly, the carrier tunneling through our hBN thin layers (3.5 nm) follows the Fowler–Nordheim model, with a barrier height of 3.7 eV, demonstrating hBN’s superior electrical insulating properties. This ability to produce high-quality hBN crystals in such a simple, environmentally friendly and economical process will advance two-dimensional material research by enabling integrated devices.

The nature of point defects in hexagonal boron nitride (hBN) is of current interest for the potential to alter its optical and electrical properties. The strong interaction between neutrons and the boron-10 isotope makes neutron irradiation a controllable way to introduce point defects in hBN. In this study, we perform Raman spectroscopy, photoluminescence, electron paramagnetic resonance (EPR), and optically detected magnetic resonance (ODMR) characterization of neutron-irradiated monoisotopic (hBN with a single boron isotope) 10 Band 11 B-enriched hBN crystalline flakes and a pyrolytic BN (pBN) reference sample. In h 10 BN and pBN, neutron irradiation produced two new Raman bands at 450 and 1335 cm −1 , which could be associated with B-related vacancies or defects. The near-bandedge optical emission was also significantly impacted by the neutron irradiation. EPR measurements clarified the origin of a high-spin defect center due to negatively charged boron vacancies, which was recently reported for similar neutron-irradiated hBN crystals. The ODMR experiments further confirmed this assignment. Hightemperature annealing partially recovered some of the hBN vibrational and optical properties. Our results are helpful to identify the nature of defects in hBN and enable defect-engineered applications such as quantum information and sensing. 10 7 4

High-quality monoisotopic hBN were synthesized using Fe-Cr flux. Boron and nitrogen were dissolved at a high temperature, then hBN single crystals were precipitated during cooling process.

Boron suboxide (B 6 O) is a boron-rich compound derived from the αrhombohedral boron lattice with extreme hardness and unusual semiconducting properties. In this work, density functional theory (DFT) was used to show that unit cell volume, mechanical strength, band gaps, and thermodynamic stabilities of B 6 O were influenced by the interstitial elements and point defects at the icosahedral sites. While the hexagonal unit cell volume (HUCV) varies with interstitial occupancy, it is the icosahedral defect that weakens the intrinsic bulk modulus of B 6 O. Using the hybrid HSE functional, we confirmed that the perfect B 6 O bulk is a p-type semiconductor with a direct band gap of 2.8 eV. Furthermore, by screening α-boron compounds systematically, we found that a simple octet rule may offer a consistent explanation for the variations in the computed electronic structures. The formation free energies calculated over a wide range of temperatures (0−2500 K) and pressures (0−80 GPa) predict that formations of interstitial defects become favorable only at higher temperatures (ca. 1800 K) in bulk B 6 O lattices. The nudged elastic band (NEB) method was employed to identify the minimum energy pathways for the diffusions of dislocated B and O atoms. The diffusion of icosahedral B atoms has an energy barrier of 0.16 eV. More complex B diffusion paths involving the reorganization of icosahedral boron atoms incur higher barriers (>1 eV). In contrast, the diffusion of interstitial O atoms is facile with a barrier of 0.4 eV. Lastly, successive O insertions into the α-B lattice were performed using DFT to generate a basic understanding of the oxidation process. These calculations provide fundamental atomistic insights into the growth of B 6 O crystals and control of their point defects.