High-temperature annealing of thick silver films (TSFs)
deposited onto a smooth dielectric substrate leads to high-order self-organization of metal clusters on the film
surface. A comparative atomic force microscopic (AFM)
analysis of “as-deposited” and annealed TSFs (aTSFs)
shows that uniform ellipsoidal roughness ∼41 × 25 nm
in lateral cross section and ∼45 nm in height results
after
annealing. These metal clusters are mutually oriented
so
that the main lateral axes of the ellipsoids are nearly
parallel. UV−visible data demonstrate a ∼300 nm
hypsocromic shift of the bands corresponding to the collective
surface plasmon modes. Additionally, a new (∼350
nm)
band related to the normal component of the plasmon
oscillations appears after annealing. This band was
found
to be strongly angle-dependent for p-polarized light.
The
aTSFs appeared extremely time- and organic solvent-stable versus as-deposited films. The aTSFs were found
to be nondisturbing surface-enhanced Raman scattering
(SERS)-active substrates in the application to studies of
complexation of crown ether styryl dyes with metal ions.
A pronounced SERS signal of the analyte rhodamine 6G
was observed with aTSFs, even when the analyte was
separated from the silver surface with five Langmuir−Blodgett monolayers of stearic acid. At the same time,
depositing only a monolayer of stearic acid on the as-deposited film completely suppressed the SERS signal of
the analyte. Finally, the self-assembling of Ag clusters
on
the surface of the aTSF, stimulated by the high-temperature annealing, results in the creation of a time- and
organic solvent-stable SERS substrate with nanometer-scale quasi-periodical roughness, and this substrate
exhibits an increased contribution of the electromagnetic
component to the overall Raman enhancement.
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