The present work shows, for the first time, a comparative experimental study on the electrodeposition of aluminium in three different water and air stable ionic liquids, namely 1-butyl-1-methylpyrrolidinium-bis(trifluoromethylsulfonyl)imide ([BMP]Tf2N), 1-ethyl-3-methylimidazolium-bis(trifluoromethylsulfonyl)imide ([EMIm] Tf2N), and trihexyl-tetradecyl-phosphoniumbis(trifluoromethylsulfonyl)imide (P(14,6,6,6) Tf2N). The ionic liquids [BMP]Tf2N and [EMIm]Tf2N show biphasic behaviour in the AlCl3 concentration range from 1.6 to 2.5 mol L(-1) and 2.5 to 5 mol L(-1), respectively. The biphasic mixtures become monophasic at temperatures >/=80 degrees C. It was found that nanocrystalline aluminium can be electrodeposited in the ionic liquid [BMP]Tf2N saturated with AlCl3. The deposits obtained are generally uniform, dense, shining, and adherent with very fine crystallites in the nanometer size regime. However, coarse cubic-shaped aluminium particles in the micrometer range are obtained in the ionic liquid [EMIm]Tf2N. In this liquid the particle size significantly increases as the temperature rises. A very thin, mirrorlike aluminium film containing very fine crystallites of about 20 nm is obtained in the ionic liquid [trihexyl-tetradecyl-phosphonium]Tf(2)N at room temperature. At 150 degrees C, the average grain size is found to be 35 nm.

The ability to electrodeposit titanium at low temperatures would be an important breakthrough for making corrosion resistant layers on a variety of technically important materials. Ionic liquids have often been considered as suitable solvents for the electrodeposition of titanium. In the present paper we have extensively investigated whether titanium can be electrodeposited from its halides (TiCl(4), TiF(4), TiI(4)) in different ionic liquids, namely1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)amide ([EMIm]Tf(2)N), 1-butyl-1-methylpyrrolidinium bis(trifluoromethyl-sulfonyl)amide ([BMP]Tf(2)N), and trihexyltetradecyl-phosphonium bis(trifluoromethylsulfonyl)amide ([P(14,6,6,6)]Tf(2)N). Cyclic voltammetry and EQCM measurements show that, instead of elemental Ti, only non-stoichiometric halides are formed, for example with average stoichiometries of TiCl(0.2), TiCl(0.5) and TiCl(1.1). In situ STM measurements show that-in the best case-an ultrathin layer of Ti or TiCl(x) with thickness below 1 nm can be obtained. In addition, results from both electrochemical and chemical reduction experiments of TiCl(4) in a number of these ionic liquids support the formation of insoluble titanium cation-chloride complex species often involving the solvent. Solubility studies suggest that TiCl(3) and, particularly, TiCl(2) have very limited solubility in these Tf(2)N based ionic liquids. Therefore it does not appear possible to reduce Ti(4+) completely to the metal in the presence of chloride. Successful deposition processing for titanium in ionic liquids will require different maybe tailor-made titanium precursors that avoid these problems.

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The electrochemical deposition of magnesium was investigated in the ionic liquids 1-ethyl-3-methylimidazolium tetrafluoroborate (EMIm BF4 ), 1-butyl-1-methylpyrrolidinium triflate (BMP TfO), and 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfo nyl)amide (BMP Tf2N ). The electrochemical window of the imidazolium ionic liquid was insufficient for reduction of magnesium triflate, whereas the BMP systems can be used for the reduction of several magnesium salts. Studies of the reduction of other magnesium salts were carried out in nonaqueous solvents such as propylene carbonate for comparison with the work in ionic liquids. Stripping peaks for magnesium were observed in solutions of phenylmagnesium chloride in BMP Tf2N at elevated temperatures (150°C) .

In the present paper, the electrodeposition of Al on flame-annealed Au(111) and polycrystalline Au substrates in two air- and water-stable ionic liquids namely, 1-butyl-1-methyl-pyrrolidinium bis(trifluoromethylsulfonyl)amide, [Py(1,4)]Tf(2)N, and 1-ethyl-3-methyl-imidazolium bis(trifluoromethylsulfonyl)amide, [EMIm]Tf(2)N, has been investigated by in situ scanning tunneling microscopy (STM), electrochemical quartz crystal microbalance (EQCM), and cyclic voltammetry. The cyclic voltammogram of aluminum deposition and stripping on Au(111) in the upper phase of the biphasic mixture of AlCl(3)/[EMIm]Tf(2)N at room temperature (25 degrees C) shows that the electrodeposition process is completely reversible as also evidenced by in situ STM and EQCM studies. Additionally, a cathodic peak at an electrode potential of about 0.55 V vs Al/Al(III) is correlated to the aluminum UPD process that was evidenced by in situ STM. A surface alloying of Al with Au at the early stage of deposition occurs. It has been found that the Au(111) surface is subject to a restructuring/reconstruction in the upper phase of the biphasic mixture of AlCl(3)/[Py(1,4)]Tf(2)N at room temperature (25 degrees C) and that the deposition is not fully reversible. Furthermore, the underpotential deposition of Al in [Py(1,4)]Tf(2)N is not as clear as in [EMIm]Tf(2)N. The frequency shift in the EQCM experiments in [Py(1,4)]Tf(2)N shows a surprising result as an increase in frequency and a decrease in damping with bulk aluminum deposition at potentials more negative than -1.8 V was observed at room temperature. However, at 100 degrees C there is a frequency decrease with ongoing Al deposition. At -2.0 V vs Al/Al(III), a bulk aluminum deposition sets in.