In this paper we describe a new Mueller matrix (MM) microscope that generalizes and makes quantitative the polarized light microscopy technique. In this instrument all the elements of the MU are simultaneously determined from the analysis in the frequency domain of the time-dependent intensity of the light beam at every pixel of the camera. The variations in intensity are created by the two compensators continuously rotating at different angular frequencies. A typical measurement is completed in a little over one minute and it can be applied to any visible wavelength. Some examples are presented to demonstrate the capabilities of the instrument.
We report the spontaneous formation of multilayer structures with nanometric periodicity during Ti–C thin-film growth by reactive magnetron sputtering. Their characterization was performed by transmission electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction, and secondary ion mass spectrometry. We discuss film structure and morphology as a function of metal content, and propose surface-directed spinodal decomposition as the mechanism responsible for the segregation of species in separated layers by up-hill diffusion.
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