2009
DOI: 10.1016/j.carbon.2008.10.045
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Efficient diffusion barrier layers for the catalytic growth of carbon nanotubes on copper substrates

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Cited by 69 publications
(40 citation statements)
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“…1, were produced using a chemical vapour deposition (CVD) process. A liquid solution of ferrocene in toluene (8.76 wt%) was injected at a rate of 0.4 ml/min into a carrier gas preheated at 200°C [31]. The carrier gases used in this study were argon and hydrogen, at slightly above atmospheric pressure.…”
Section: Methodsmentioning
confidence: 99%
“…1, were produced using a chemical vapour deposition (CVD) process. A liquid solution of ferrocene in toluene (8.76 wt%) was injected at a rate of 0.4 ml/min into a carrier gas preheated at 200°C [31]. The carrier gases used in this study were argon and hydrogen, at slightly above atmospheric pressure.…”
Section: Methodsmentioning
confidence: 99%
“…It is observed from the SEM images in Figure 5(a) that the substrate surface was lacking the catalytic nanoparticles. The disappearance of catalytic nanoparticles could be discussed by the fact that the catalysts may diffuse into the oxide layer on the surface of Cu substrate during the CVD process [11,23]. In contrast, the higher density of catalytic nanoparticles can be observed in Figure 5(b).…”
Section: Resultsmentioning
confidence: 97%
“…Next, lithography patterning is performed to create the opening for the depositing of Au or Cu metallization by e-beam evaporation. After the first metallization is completed, a second lithography step is performed for the catalyst (used for CNT growth) and its barrier layer required for CNT growth [12][13][14]. The final 4″ wafer is then diced using a dicing machine and is ready for the growth of CNT.…”
Section: Design and Fabrication Of Flip Chip Structure For High-frequmentioning
confidence: 99%