Gallium oxide, and in particular its thermodynamically stable β-Ga2O3 phase, is within the most exciting materials in research and technology nowadays due to its unique properties. The very high breakdown electric field and the figure of merit rivaled only by diamond have tremendous potential for the next generation “green” electronics enabling efficient distribution, use, and conversion of electrical energy. Ion implantation is a traditional technological method used in these fields, and its well-known advantages can contribute greatly to the rapid development of physics and technology of Ga2O3-based materials and devices. Here, the status of ion implantation in β-Ga2O3 nowadays is reviewed. Attention is mainly paid to the results of experimental study of damage under ion irradiation and the properties of Ga2O3 layers doped by ion implantation. The results of ab initio theoretical calculations of the impurities and defect parameters are briefly presented, and the physical principles of a number of analytical methods used to study implanted gallium oxide layers are highlighted. The use of ion implantation in the development of Ga2O3-based devices, such as metal oxide field-effect transistors, Schottky barrier diodes, and solar-blind UV detectors, is described together with systematical analysis of the achieved values of their characteristics. Finally, the most important challenges to be overcome in this field of science and technology are discussed.

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An original approach has been presented to model the regularities and parameters of resistive switching based on the kinetic Monte Carlo (kMС) 3D simulation of stochastic migration of oxygen vacancies/ions in metal-oxide memristive devices promising for applications in emerging nonvolatile memory, in-memory and neuromorphic computing systems. The efficiency and flexibility of the approach is demonstrated by the examples of experimentally realized Au/oxide/TiN memristive device structures, in which yttria-stabilized zirconia (ZrO2(Y)) polycrystalline films and amorphous SiOx columnar films obtained by magnetron sputtering are used as the switching oxide material. The proposed approach combines the universal kMС framework for ion migration and relatively simple physics-based methods for taking into account additional factors related to the structure and morphology of specific oxide material, interface phenomena and energetics of electronic processes, and therefore does not require time-consuming calculations and is not critical to the computing power.