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Hard magnetic CoPtP films for MEMS application were electrodeposited on the various structures of copper substrate such as copper foil, copper seed layer and nano porous copper layer. The structural influence of copper substrates provided a reasonable explanation for the correlation of the magnetic properties of electrodeposited CoPtP alloy, because magneto-crystalline anisotropy could account for the enhancement of the perpendicular magnetic properties (Coercivity in highest range is achieved from 9.1 to 14.9 KOe) of the films. Also the influence of deposition current density on the chemical composition that changes the growth morphology, microstructure, and magnetic properties are studied.

At this present task, an attempt done in order to synthesize NiFeCo3O4 ternary thin film electrode by Electrodeposition method. Microstructure of the films studied using X-ray diffraction, energy dispersive X-ray spectroscopy (EDAX) and Field emission (FESEM) scanning electron microscopy. Films Electrochemical property were studied and confirmed with the help of charge discharge techniques using cyclic voltammetry, which confirms that the prepared electrode has excellent electrochemical capacitive behaviour with 757 F g–1 specific capacitance value of at the density in current about 1 mA g–1.