We measured the statistical properties of Barkhausen noise in finemet films with nominal composition Fe73.5Cu1Nb3Si22.5B4 and variable thickness between 25 and 1000nm. Films have been sputtered on glass substrates and their structure is amorphous. The critical exponents of the power-law distributions for the jumps amplitude show a remarkable stability over the whole thickness range, whereas the other macroscopic magnetic properties undergo strong variations. The value of the critical exponent is about 0.8 between 50 and 500nm with a small increase up to 1.0 at 1000nm. These values are similar to those observed with the same experimental technique in other two-dimensional (2D) systems, but definitely smaller with respect to the values observed in truly three-dimensional (3D) systems. Our data therefore indicate that, in the investigated thickness range, the behavior remains typical of 2D systems. The small increase of the critical exponent at 1000nm might be an indication of a starting transition toward a 3D behavior.
The problem of in situ monitoring the film thickness by quartz microbalance during vacuum
deposition of organic-molecular semiconductors is addressed herein by setting a procedure for
sensor calibration based on ex situ analysis of the deposited molecular film by atomic-force
microscopy measurements. The procedure is applied to the growth of molecular-organic thin films
on silica. Some physical parameters of the materials are deduced
an advanced MHz-class repetition rate X-ray source for linear regime time-resolved spectroscopy and photon scattering, Nuclear Inst. and Methods in Physics Research, A (2019),
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.