A low cost and low temperature thin film packaging process based on the transfer of an electroplated Nickel 3D cap is proposed. This process is based on adhesion control of a thick molded cap Ni film on the carrier wafer by using a plasma deposited fluorocarbon film, on mechanical debonding and on adhesive bonding of the microcaps on the host wafer with BCB sealing rings. Mechanical characterizations show that the transferred microcaps have a high stiffness, a low stress and a high adhesion. Because this process is simple and only involves a low temperature (250°C) heating of the host wafer, it is highly versatile and suitable for the encapsulation of micro and nano devices, circuits and systems elaborated on a large range of substrate materials.
The high specific surface of porous silicon and its high reactivity makes this material a good candidate for chemical sensors based on electrical or electromechanical devices. In this paper, several processes are presented to realize free-standing porous silicon microstructures (membranes and cantilever beams). Good resonance quality factors were measured (Q = 110 and 760 respectively) demonstrating that porous silicon is a suitable material for resonant chemical sensors.
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