GaN based high electron mobility transistors (HEMTs) have demonstrated extraordinary features in the applications of high power and high frequency devices. In this paper, we review recent progress in AlGaN/GaN HEMTs, including the following sections. First, challenges in device fabrication and optimizations will be discussed. Then, the latest progress in device fabrication technologies will be presented. Finally, some promising device structures from simulation studies will be discussed.
Ni
x
Co
y
/H-ZrO2 catalysts
composed of highly dispersed Ni
x
Co
y
nanoparticles supported by
mesoporous ZrO2 hollow sphere are synthesized by templating
and impregnation processes. According to thermogravimetric analysis,
X-ray photoelectron spectroscopy, and dry reforming results, a synergetic
reaction mechanism is proposed to explain the better performance of
alloy catalysts compared to Ni/H-ZrO2 or Co/H-ZrO2. In dry reforming of methane (DRM) reaction, Ni and Co act as catalysts
for CH4 cracking and CO2 reduction, respectively,
and the induced carbon deposits on Ni can be oxidized by the active
oxygen left on Co, which regenerate the metal surface for the following
reaction. Among all the alloy catalysts, the Ni0.8Co0.2/H-ZrO2 catalyst presents the highest activity
and stability because the strong metal–support interaction
prevents the sintering of nanocatalysts at high temperature and the
hollow structure enhances the mass transportation of reactants and
products. More importantly, Ni and Co can synergistically balance
the speed of CH4 cracking and CO2 reduction,
which effectively avoid coke accumulation/catalyst oxidation and ensure
fast and stable conversion for DRM reaction.
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