Huge thermal noise owing to the narrow energy bandgap is one of the critical issues for group IV-based photonics in the mid-infrared regime. With this motivation, we examined to form Ge1−xSnx/Ge1−x−ySixSny quantum heterostructures (QHs) by molecular beam epitaxy for realizing resonant tunneling diodes composed of group-IV materials. We confirmed the formation of approximately 2 nm-thick Ge1−xSnx/Ge1−x−ySixSny QHs with atomically flat interfaces by x-ray diffraction and transmission electron microscopy methods. Moreover, by the current density–voltage (J–V) measurement at 10 K, we observed the occurrence of a non-linear distinct hump in the J–V characteristic, which is possibly originated from quantum transport of heavy holes. According to the tunneling transmission spectra simulation result, the hump property would be due to two possible scenarios: a resonant tunneling of heavy holes in the QH and/or a resonance phenomenon that heavy holes pass just above a potential barrier.

No abstract

No abstract

No abstract

Controlling the morphology and composition of semiconductor nano- and micro-structures is crucial for fundamental studies and applications. Here, Si-Ge semiconductor nanostructures were fabricated using photolithographically defined micro-crucibles on Si substrates. Interestingly, the nanostructure morphology and composition of these structures are strongly dependent on the size of the liquid–vapour interface (i.e., the opening of the micro-crucible) in the CVD deposition step of Ge. In particular, Ge crystallites nucleate in micro-crucibles with larger opening sizes (3.74–4.73 μm2), while no such crystallites are found in micro-crucibles with smaller openings of 1.15 μm2. This interface area tuning also results in the formation of unique semiconductor nanostructures: lateral nano-trees (for smaller openings) and nano-rods (for larger openings). Further TEM imaging reveals that these nanostructures have an epitaxial relationship with the underlying Si substrate. This geometrical dependence on the micro-scale vapour–liquid–solid (VLS) nucleation and growth is explained within a dedicated model, where the incubation time for the VLS Ge nucleation is inversely proportional to the opening size. The geometric effect on the VLS nucleation can be used for the fine tuning of the morphology and composition of different lateral nano- and micro-structures by simply changing the area of the liquid–vapour interface.