A non‐contact vacuum‐patterning method is described to sublime OLED materials from a donor to a substrate. Radiation‐induced sublimation transfer (RIST) enables the manufacture of full‐color OLED devices on large‐scale mother glass, at high yield, by eliminating precision shadow masks and donor contact, which are used in evaporation and laser‐induced thermal imaging, respectively. Device performance (color, efficiency, stability) is reported for RIST devices and evaporated controls; comparisons to evaporation and other patterning methods are described, and a full‐color AM‐OLED device was fabricated.

Performance and design freedom are advancing organic light‐emitting diode (OLED) lighting, providing differentiation from general lighting to transportation and more. OLED is the first naturally diffuse lighting, with pure qualities highly prized by designers. Razor thin with superb color characteristics and uniformity, OLED offers an alternative to high‐glare lighting sources and allows a variety of innovative applications and attractive designs.