A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computergenerated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 µm behind the mask. The results show a improvement of the achieved resolution -linewidth as good as 1.5 µm -what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source.

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In this study, the plasma density and electron temperature of Radio Frequency (RF) plasmas were determined by three types of Langrnuir probes, namely a conventional double probe, a single probe with RF, choke and a single probe with RF choke and compensating electrode. The same plasmas were characterized by the three probes, each performing three measurements per plasma condition, in order to determine the precision of the measurement results. After performing a comparative analysis, which looked at the precision and the accuracy of these results, .the conclusion is that the double probe, which has already the advantage of the simplest construction, yields the most reliable results for both capacitively and inductively coupled RF plasmas. The single probe with RF choke and compensating electrode has a similar precision as the single probe without compensating electrode, but its accuracy is better.

A cubic-phase distribution is applied in the design and fabrication of inexpensive lenses for passive infrared motion sensors. The resulting lenses produce a point spread function (PSF) capable to distinguish the presence of humans from pets by the employment of the so-called wavefront coding method. The cubic phase distribution used in the design can also reduce the optical aberrations present on the system. This aberration control allows a low tolerance in the fabrication of the lenses and in the alignment errors of the sensor. The lens was manufactured on amorphous hydrogenated carbon thin film, by employing well-known micro fabrication process steps. The optical results demonstrates that the optical power falling onto the detector surface is attenuated for targets that present a mass that is horizontally distributed in space (e.g. pets) while the optical power is enhanced for targets that present a mass vertically distributed in space (e.g. humans).

A small Fresnel lens array was diamond turned in a single crystal (0 0 1) InSb wafer using a half-radius negative rake angle (−25 • ) single-point diamond tool. The machined array consisted of three concave Fresnel lenses cut under different machining sequences. The Fresnel lens profiles were designed to operate in the paraxial domain having a quadratic phase distribution. The sample was examined by scanning electron microscopy and an optical profilometer. Optical profilometry was also used to measure the surface roughness of the machined surface. Ductile ribbon-like chips were observed on the cutting tool rake face. No signs of cutting edge wear was observed on the diamond tool. The machined surface presented an amorphous phase probed by micro Raman spectroscopy. A successful heat treatment of annealing was carried out to recover the crystalline phase on the machined surface. The results indicated that it is possible to perform a 'mechanical lithography' process in single crystal semiconductors.