A GaN/AlGaN ultraviolet light emitting diode (UV-LED) structure with a porous AlGaN reflector structure has been demonstrated. Inside the UV-LED, the n+-AlGaN/undoped-AlGaN stack structure was transformed into a porous-AlGaN/undoped-AlGaN stack structure through a doping-selective electrochemical etching process. The reflectivity of the porous AlGaN reflector was 93% at 374 nm with a stop-bandwidth of 35 nm. In an angle-dependent reflectance measurement, the central wavelength of the porous AlGaN reflector had blueshift phenomenon by increasing light-incident angle from 10° to 50°. A cut-off wavelength was observed at 349 nm due to the material absorption of the porous-AlGaN/u-AlGaN stack structure. In the treated UV-LED structure, the photoluminescence emission wavelength was measured at 362 nm with a 106° divergent angle covered by the porous-AlGaN reflector. The light output power of the treated UV-LED structure was higher than that of the non-treated UV-LED structure due to the high light reflectance on the embedded porous AlGaN reflector.

A GaN/AlGaN-based ultraviolet light-emitting diode (LED) structure with an embedded porous-AlGaN reflector was fabricated by a doping-selective electrochemical (EC) wet-etching process. The n+-AlGaN/undoped-AlGaN (u-AlGaN) stack structures with different Al contents were transformed into porous-AlGaN/u-AlGaN stack structures that acted as the embedded distributed Bragg reflectors (DBRs). The porosity of the EC-treated AlGaN layer was increased by decreasing the Al content in the n+-AlGaN layer. The reflectivity of the porous-AlGaN DBR structure was measured to be 90% at 379.3 nm with a 37.2 nm stopband width. The photoluminescence emission intensity of the DBR-LED was enhanced by forming the embedded porous-AlGaN DBR structure.

GaN-based ultraviolet photodiode with porous distributed Bragg reflectors (DBR) structure was demonstrated. The n +-AlGaN:Si epitaxial layers with high refractive index had been etched as porous-AlGaN layers with low refractive index through an electrochemical etched process. The peak wavelength of the responsivity spectra was measured at 355 nm, which was matched to the high reflectance wavelength region of the porous reflector. High photocurrent and large UV/visible rejection ratio were measured in the GaN photodiode with the porous-AlGaN reflector due to the light recycling process in the resonance cavity structure.