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This article presents laser interference lithography, a preferred method to achieve periodic structures in a large area with fast speed and low cost. Simulations and experiments for two-beam interference lithography with single exposure and double exposure were expressed. In the experiments, patterns on photoresist were transferred to a silicon substrate by wet etching. The experimental results were consistent with the simulative results. The one-dimensional nanogrooves were obtained by single exposure, and different widths of nanogrooves during the same period were fabricated on silicon substrates by varying exposure time. In addition, two-dimensional grid patterns were obtained by double exposure. With the increasing of exposure time, the grid pattern changed from a nanoholes array to a nanodots array. The results showed that laser interference lithography is an efficient method to fabricate nanostructures with various geometrical parameters by controlling exposure time, which has a promising application in the study of nanotextured surface properties, such as wetting, adhesion and friction.

The electronic-controlling nanotribological behavior of textured silicon surfaces was investigated by an atomic force microscope (AFM), which were fabricated by laser interference lithography and chemical etching. The results indicated that without an external bias, friction on textured surfaces was greater than that on smooth surfaces and it was related to the coverage rate of the microgrooves. With an external bias, friction on smooth and textured surfaces decreased at first and then increased approximately linearly as the external bias increased.