Pulsed laser deposition (PLD) from a hot pressed manganese doped ZnS target using a KrF laser, has produced a high rate deposition method for growing luminescent thin films. Good stoichiometric quality and typical luminescent crystal structures have been observed with a predominant hexagonal phase and little evidence of the cubic phase. The luminescent characteristics were determined by cathodoluminescence and photoluminescence excitation and stable electroluminescence was observed under pulsed dc conditions with a minimum brightness of 150 cd/m2. PLD film characteristics are compared with those observed in radio-frequency sputtered samples.

The optical plume emissions produced on excimer laser ablation of a YBa2Cu3O7 target are reported and identified with the various atomic, ionic, and molecular species present. The spatial and temporal distribution of these emissions were studied as a function of the laser fluence and oxygen pressure. At the laser fluences used (4–6 J/cm2) some target material is ablated or evaporated directly in molecular form. In addition efficient formation of molecular oxides is observed at the contact front of the expanding plume with the surrounding oxygen atmosphere. The intensity and spatial distribution of oxide emission in the visible plume therefore provides a sensitive diagnostic for optimization of substrate location and deposition conditions.

Time-resolved optical absorption spectroscopy techniques were used to study Ba, metastable Ba+, and YO absorptions in the laser-produced plasma plume from a YBa2Cu3O7 target. Results obtained indicate an initial explosive removal of material from the target surface followed by a subsequent evaporation process. Some YO is ejected from the target in molecular form, particularly at laser fluence <6 J/cm2, whilst additional YO is formed in subsequent reactions of Y with oxygen at the plasma plume edges. The formation of metastable Ba+ (52D5/2) is also observed in the outer reactive layers of the plasma plume.

The plasma produced during laser ablation deposition of thin film YBCO has been studied by optical emission spectroscopy. There is evidence of increased YO band emission in the range 590-625 nm as the ambient oxygen gas pressure confining the plume is increased in the range 30-200 m Torr. Temporal profiles show that close to the target the plume is insensitive to ambient oxygen pressure. It is deduced that the optical emission here is excited by electron impact excitation. Further away from the target there is evidence that two distinct processes are at work. One is again electron excitation; the emission from this process decreases with distance because the expanding plmne cools and collisions become less frequent in the expanding gas. The second is driven by oxidation of atomic species expelled at high speeds from the target. The main region of this activity is in the plume sheath where a shock front ensures heating of ambient O2 and reaction of monatomic plasma species to form oxide in an exotherrnic reaction. Spatial mapping of the emission demonstrates clearly how increasing oxygen gas pressure confines the plasma and enhances the emission intensity from the molecular YO species ejected from the target in a smaller region close to the target. Ba + is observed as a dominant species only very close to (within 1 mm of) the target. Absorption spectra have been taken in an attempt to examine ground state and cool species in the plume. They reveal the quite surprising result that YO persists in the chamber for periods up to 1 msec. This suggests an explanation for the recent report of off-axis laser deposition in terms of simple condensation. Previously, quasi-ballistic transfer of material from target to substrate has been considered the only significant process.

The optimization of interrelated deposition parameters during deposition of in situ YBa2Cu3O7 thin films on MgO 〈001〉 substrates by KrF laser ablation was systematically studied in a single experimental chamber. The optimum condition was found to be a substrate temperature of 720 °C and a target-substrate distance of 5 cm in an oxygen partial pressure of 100 mTorr. These conditions produced films with Tc = 87 K. The presence of YO in the plasma plume was found to be important in producing good quality films. The films were characterized by resistance-temperature measurements, energy dispersive x-ray analyses, scanning electron microscopy, and x-ray-diffraction measurements, and the physical reasons underlying film quality degradation at parameter values away from optimal are discussed.