Photothermal microscopy based on combined optical and electrical excitation has been applied to insulating lines prepared by focused ion beam implentation on oxygen implanted mesas. The double excitation technique permits to image electrical properties of the implanted structures which are complementary to simple defect tracing when a single excitation is applied. In addition, the contrast of imaging of implanted structures can be increased considerably. Apart from combining modulated optical excitation with electrical direct current voltages, double modulation configurations can improve the contrast further, by detecting either on a higher harmonic of the single excitation frequency or on the sum or difference of two different excitation frequencies. The influence of different parameters characterizing the experimental configuration gives information on the physical processes of the signal generation, indicating that the observed contrast enhancement is mainly of thermal origin related to the photoinduced currents.